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Very high perfonnance 50 nm T-gate III-V HEMTs enabled by robust nanofabrication technologies

Thayne, I., Cao, X., Moran, D., Boyd, E., Elgaid, Khaled, McLelland, H., Holland, M., Thoms, S. and Stanley, C. 2004. Very high perfonnance 50 nm T-gate III-V HEMTs enabled by robust nanofabrication technologies. Presented at: 4th IEEE Conference on Nanotechnology, 2004, Munich, 16-19 August 2004. p. 95. 10.1109/NANO.2004.1392261

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Item Type: Conference or Workshop Item (Paper)
Date Type: Submission
Status: Unpublished
Schools: Engineering
Last Modified: 15 Mar 2018 13:59
URI: http://orca.cf.ac.uk/id/eprint/109573

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