Cardiff University | Prifysgol Caerdydd ORCA
Online Research @ Cardiff 
WelshClear Cookie - decide language by browser settings

Nanoscale structures for implementation of anti-reflection and self-cleaning functions

Wang, Zuobin, Zhang, Jin, Hang, Lingxia, Jiang, Shilei, Liu, Guoqiang, Ji, Ze, Tan, Chunlei and Sun, Huan 2013. Nanoscale structures for implementation of anti-reflection and self-cleaning functions. International Journal of Nanomanufacturing 9 (5/6) , pp. 520-531. 10.1504/IJNM.2013.057596

Full text not available from this repository.

Abstract

Well-designed optical sub-wavelength surface relief structures could be used for minimising the reflection losses at the surface, and be used to increase the hydrophobic property of the surface, so that to improve the efficiencies and reduce the maintaining costs of solar cells. Interference lithography technology provides a way to fabricate a fine surface structure with the periods that are much shorter than the wavelengths of near infrared or visible light. The morphology of the microstructure by multi-beam interference lithography can be controlled, allowing the design of sub-wavelength structure surfaces with both anti-reflection (AR) and self-cleaning functions. In this paper, the analysis of the anti-reflection sub-wavelength relief structure and the self-cleaning relief structure is given, and the realisation method for a multi-functional structure using the interference lithography technology is presented.

Item Type: Article
Date Type: Published Online
Status: Published
Schools: Engineering
Publisher: Inderscience
ISSN: 1746-9392
Last Modified: 12 Apr 2018 19:50
URI: http://orca.cf.ac.uk/id/eprint/110039

Citation Data

Cited 2 times in Scopus. View in Scopus. Powered By Scopus® Data

Actions (repository staff only)

Edit Item Edit Item