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Superconducting diamond on silicon nitride for device applications

Bland, Henry A., Thomas, Evan L. H., Klemencic, Georgina M. ORCID: https://orcid.org/0000-0002-2125-9754, Mandal, Soumen ORCID: https://orcid.org/0000-0001-8912-1439, Morgan, David J. ORCID: https://orcid.org/0000-0002-6571-5731, Papageorgiou, Andreas, Jones, Tyrone G. and Williams, Oliver A. ORCID: https://orcid.org/0000-0002-7210-3004 2019. Superconducting diamond on silicon nitride for device applications. Scientific Reports 9 , 2911. 10.1038/s41598-019-39707-z

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Abstract

Chemical vapour deposition (CVD) grown nanocrystalline diamond is an attractive material for the fabrication of devices. For some device architectures, optimisation of its growth on silicon nitride is essential. Here, the effects of three pre-growth surface treatments, often employed as cleaning methods, were investigated. Such treatments provide control over the surface charge of the silicon nitride substrate through modification of the surface functionality, allowing for the optimisation of electrostatic diamond seeding densities. Zeta potential measurements and X-ray photoelectron spectroscopy (XPS) were used to analyse the silicon nitride surface following each treatment. Exposing silicon nitride to an oxygen plasma offered optimal surface conditions for the electrostatic self-assembly of a hydrogen-terminated diamond nanoparticle monolayer. The subsequent growth of boron-doped nanocrystalline diamond thin films on modified silicon nitride, under CVD conditions, produced coalesced films for oxygen plasma and solvent treatments, whilst pin-holing of the diamond film was observed following RCA-1 treatment. The sharpest superconducting transition was observed for diamond grown on oxygen plasma treated silicon nitride, demonstrating it to be of the least structural disorder. Modifications to the substrate surface optimise the seeding and growth processes for the fabrication of diamond on silicon nitride devices.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Physics and Astronomy
Chemistry
Publisher: Nature Publishing Group
ISSN: 2045-2322
Date of First Compliant Deposit: 30 January 2019
Date of Acceptance: 28 January 2019
Last Modified: 06 Jan 2024 04:23
URI: https://orca.cardiff.ac.uk/id/eprint/119029

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