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Patterned accumulation mode capacitive phase shifter

Ciena Corporation, Hanover, MD, USA 2019. Patterned accumulation mode capacitive phase shifter. US 10, 330, 962 B1. [Patent].

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Abstract

A semiconductor waveguide device includes a first semiconductor layer having a first surface, wherein the first surface comprises a first protrusion and a second protrusion collectively forming a first trench in the first semiconductor layer, a second semiconductor layer having a second surface opposing the first surface of the first semiconductor layer, and an insulator layer disposed between and in contact with the first surface and the second surface, wherein the first semiconductor layer, the second semiconductor layer, and the insulator layer form a semiconductor waveguide region, and wherein the first trench is configured to confine a mode of light beam propagation in the semiconductor waveguide region

Item Type: Patent
Date Type: Publication
Status: Published
Schools: Physics and Astronomy
Subjects: Q Science > QC Physics
Last Modified: 22 Aug 2019 10:07
URI: http://orca.cf.ac.uk/id/eprint/124020

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