Double gyroids for frequency-isolated weyl points in the visible regime and interference lithographic design

Park, Haedong and Lee, Seungwoo 2020. Double gyroids for frequency-isolated weyl points in the visible regime and interference lithographic design. ACS Photonics 7 (6) , pp. 1577-1585. 10.1021/acsphotonics.0c00532

Full text not available from this repository.

Abstract

Easy-to-craft photonic crystals enabling frequency-isolated Weyl points, especially at visible wavelengths, are yet to be developed. To this end, we exploited double gyroid (DG) crystals with Parity (P)-breaking and nanoscale unit cells, which are readily compatible with currently accessible interference lithography (IL). By modulating a level-set equation, we designed the D2-symmetric single gyroid (SG), perturbed from an O-symmetric SG, and found that the DG crystals, consisting of D2- and O-symmetric SGs with opposite chirality, can exhibit frequency-isolated Weyl points. As a route to the fabrication of the designed P-breaking DG crystals with a nanoscale unit cell, the IL condition was defined in terms of (i) wavenumbers of multiple beams and (ii) their own complex electric fields. Our lithographically designed nanoscale DG crystals, even with a practical material condition, exhibited the Weyl points whose wavelengths were totally separated from other neighboring bands. Given the established design strategy suitable for a practical processing (e.g., IL), we have provided a viable route for on-chip integration of such Weyl materials, enabling topologically nontrivial surface states.

Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Physics and Astronomy
Publisher:	American Chemical Society
ISSN:	2330-4022
Date of Acceptance:	28 April 2020
Last Modified:	22 Jan 2021 15:25
URI:	https://orca.cardiff.ac.uk/id/eprint/137870

Citation Data

Cited 10 times in Scopus. View in Scopus. Powered By Scopus® Data

Actions (repository staff only)

Edit Item