Atomic layer deposition of titanium nitride for quantum circuits

Shearrow, Abigail, Koolstra, Gerwin, Whiteley, Samuel J., Earnest, Nathan, Barry, Peter S., Heremans, F. Joseph, Awschalom, David D., Shirokoff, Erik and Schuster, David I. 2018. Atomic layer deposition of titanium nitride for quantum circuits. Applied Physics Letters 113 (21) 10.1063/1.5053461

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Item Type:	Article
Date Type:	Published Online
Status:	Published
Schools:	Physics and Astronomy
Publisher:	American Institute of Physics
ISSN:	0003-6951
Date of Acceptance:	2 October 2018
Last Modified:	15 May 2023 09:30
URI:	https://orca.cardiff.ac.uk/id/eprint/155709

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