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The nature of nitrogen related point defects in common forms of InN

Butcher, K S A, Fernandes, A J, Chen, P P T, Wintrebert -Fouquet, M, Timmers, H, Shrestha, S K, Hirshy, Hassan and Perks, Richard Marc 2007. The nature of nitrogen related point defects in common forms of InN. Journal of Applied Physics 101 (12) , 123702. 10.1063/1.2736654

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Abstract

The role of point defects related to the presence of excess nitrogen is elucidated for InN thin films grown by different techniques. Elastic recoil detection analysis has shown the presence of excess nitrogen in state-of-the-art InN films. Using x-ray photoelectron spectroscopy and x-ray diffraction it is shown that two distinct forms of point defects can be distinguished; one of these appears to be an interstitial form of nitrogen, common in some forms of polycrystalline InN. The other is associated with a combined biaxial and hydrostatic strain observed for molecular beam epitaxy (MBE) and chemical vapor deposition (CVD) grown films, and may be a mixture of the nitrogen-on-metal antisite defect and lower densities of indium vacancies and interstitial nitrogen. The high density of defects present in all the InN samples examined suggests that stoichiometry related point defects dominate the electrical and optical properties of the material. The difference in the type of point defect observed for polycrystalline (rf sputtered) and epitaxial (MBE and CVD) InN supports existing evidence that the Moss-Burstein effect is not an adequate description of the apparent band-gap difference between InN samples grown by different techniques.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Engineering
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Uncontrolled Keywords: nitrogen, indium compounds, III-V semiconductors, semiconductor epitaxial layers, interstitials, vacancies (crystal); antisite defects ; ion microprobe analysis ; X-ray photoelectron spectra ; X-ray diffraction
Additional Information: Publisher's copyright requirements "Copyright (2004) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Tian, Y and Li, G and Shinar, J and Wang, N. L. and Cook, B A and Anderegg, J. W. and Constant, A. P. and Russell, A M and Snyder, John Evan (2004) Electrical transport in amorphous semiconducting AlMgB14 films. Applied Physics Letters , 85 (7). pp. 1181-1183. ISSN 10773118 (10.1063/1.1781738)and may be found at http://apl.aip.org/resource/1/applab/v85/i7/p1181_s1."
Publisher: American Institute of Physics
ISSN: 1089-7550
Last Modified: 17 Jun 2017 02:17
URI: http://orca.cf.ac.uk/id/eprint/1939

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