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Atomic layer deposition of ZnO thin films on boron-doped nanocrystalline diamond

Hikavyy, A., Clauws, P., Vanbesien, K., De Visschere, P., Williams, Oliver Aneurin, Daenen, M., Haenen, K., Butler, J. E. and Feygelson, T. 2007. Atomic layer deposition of ZnO thin films on boron-doped nanocrystalline diamond. Diamond and Related Materials 16 (4-7) , pp. 983-986. 10.1016/j.diamond.2006.11.035

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Abstract

ZnO thin films were successfully prepared on boron-doped nanocrystalline diamond NCD by means of atomic layer chemical vapour deposition. Their growth and properties are similar to the layers grown by the same technique on glass. The layers thickness can be easily monitored by the number of precursors pulses. The ZnO layers are uniform and have perfect adhesion to NCD. Electrical measurements show that there is no current rectification if highly doped NCD and low resistance ALCVD ZnO are used. On the contrary, a rectifying behaviour can be obtained if lightly boron-doped NCD and resistive hydrothermally prepared ZnO are used.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Physics and Astronomy
Subjects: Q Science > QC Physics
Uncontrolled Keywords: ZnO; Nanocrystalline diamond; ALCVD
Publisher: Elsevier
ISSN: 0925-9635
Last Modified: 04 Jun 2017 04:11
URI: http://orca.cf.ac.uk/id/eprint/34160

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