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Controlling the nanoscale patterning of AuNPs on silicon surfaces

Williams, Sophie E., Davies, Philip Rosser, Bowen, Jenna L. and Allender, Christopher John 2013. Controlling the nanoscale patterning of AuNPs on silicon surfaces. Nanomaterials 3 (1) , pp. 192-203. 10.3390/nano3010192

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Abstract

Abstract: This study evaluates the effectiveness of vapour-phase deposition for creating sub-monolayer coverage of aminopropyl triethoxysilane (APTES) on silicon in order to exert control over subsequent gold nanoparticle deposition. Surface coverage was evaluated indirectly by observing the extent to which gold nanoparticles (AuNPs) deposited onto the modified silicon surface. By varying the distance of the silicon wafer from the APTES source and concentration of APTES in the evaporating media, control over subsequent gold nanoparticle deposition was achievable to an extent. Fine control over AuNP deposition (AuNPs/μm2) however, was best achieved by adjusting the ionic concentration of the AuNP-depositing solution. Furthermore it was demonstrated that although APTES was fully removed from the silicon surface following four hours incubation in water, the gold nanoparticle-amino surface complex was stable under the same conditions. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) were used to study these affects.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Cardiff Catalysis Institute (CCI)
Chemistry
Pharmacy
Subjects: Q Science > QD Chemistry
R Medicine > RM Therapeutics. Pharmacology
Uncontrolled Keywords: vapour-phase deposition; APTES; gold; nanoparticle; chemical nanopatterning
Additional Information: Pdf uploaded in accordance with publisher's policy at http://www.sherpa.ac.uk/romeo/issn/2079-4991/ (accessed 20/02/2014).
Publisher: MDPI AG
ISSN: 2079-4991
Date of First Compliant Deposit: 30 March 2016
Last Modified: 17 Jun 2017 07:44
URI: http://orca.cf.ac.uk/id/eprint/46636

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