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The electron-phonon relaxation time in thin superconducting titanium nitride films

Kardakova, A., Finkel, M., Morozov, Dmitry L., Kovalyuk, V., An, P., Dunscombe, Christopher John, Tarkhov, M., Mauskopf, Philip Daniel, Klapwijk, T. M. and Goltsman, G. 2013. The electron-phonon relaxation time in thin superconducting titanium nitride films. Applied Physics Letters 103 (25) , 252602. 10.1063/1.4851235

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Abstract

We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Physics and Astronomy
Subjects: Q Science > QC Physics
Additional Information: Pdf uploaded in accordance with publisher's policy at http://www.sherpa.ac.uk/romeo/issn/0003-6951/ (accessed 20/02/2014).
Publisher: American Institute of Physics
ISSN: 0003-6951
Date of First Compliant Deposit: 30 March 2016
Last Modified: 14 Sep 2019 23:09
URI: http://orca.cf.ac.uk/id/eprint/53929

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