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Development and validation of functional imprint material for the step and flash imprint lithography process

Kettle, J., Coppo, P., Lalev, Georgi Maximov, Tattershall, C., Dimov, Stefan Simeonov and Turner, M. L. 2008. Development and validation of functional imprint material for the step and flash imprint lithography process. Microelectronic Engineering 85 (5-6) , pp. 850-852. 10.1016/j.mee.2007.12.070

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Item Type: Article
Date Type: Publication
Status: Published
Schools: Chemistry
Engineering
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
ISSN: 0167-9317
Last Modified: 05 Jun 2017 02:09
URI: http://orca.cf.ac.uk/id/eprint/6031

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Cited 12 times in Web of Science. View in Web of Science.

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