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Silica based polishing of {100} and {111} single crystal diamond

Thomas, Evan L. H., Mandal, Soumen, Brousseau, Emmanuel Bruno Jean Paul and Williams, Oliver Aneurin 2014. Silica based polishing of {100} and {111} single crystal diamond. Science and Technology of Advanced Materials 15 (3) , pp. 1-7. 10.1088/1468-6996/15/3/035013

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Abstract

Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard chemical mechanical polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square and 0.31 to 0.09 nm rms for {100} and {111} samples respectively was observed.

Item Type: Article
Date Type: Published Online
Status: Published
Schools: Centre for Advanced Manufacturing Systems At Cardiff (CAMSAC)
Engineering
Physics and Astronomy
Subjects: Q Science > QC Physics
T Technology > TA Engineering (General). Civil engineering (General)
Additional Information: Pdf uploaded in accordance with the publisher’s policy at http://www.sherpa.ac.uk/romeo/issn/1468-6996/(accessed 10/07/2014)
Publisher: Institute of Physics
ISSN: 1468-6996
Funders: EPSRC
Date of First Compliant Deposit: 30 March 2016
Date of Acceptance: 4 June 2014
Last Modified: 18 Feb 2019 14:48
URI: http://orca.cf.ac.uk/id/eprint/60956

Citation Data

Cited 14 times in Scopus. View in Scopus. Powered By Scopus® Data

Cited 2 times in Web of Science. View in Web of Science.

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