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High density self assembled nanoparticle film with temperature-controllable interparticle spacing for deep sub-wavelength nanolithography using localized surface plasmon modes on planar silver nanoparticle tunable grating

Lewis, S., Wheeler-Jones, R., Haynes, V. and Perks, Richard Marc 2008. High density self assembled nanoparticle film with temperature-controllable interparticle spacing for deep sub-wavelength nanolithography using localized surface plasmon modes on planar silver nanoparticle tunable grating. Microelectronic Engineering 85 (2) , pp. 486-491. 10.1016/j.mee.2007.09.005

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Abstract

A novel photolithographic technique using a periodic hexagonal close packed silver nanoparticle 2D array photo mask has been demonstrated to transfer a nano-pattern into a photoresist using G–I line proximity photolithography. This method can be made to precisely control the spacing between nanoparticles by using temperature. The high-density nanoparticle thin film is accomplished by self assembly through the Langmuir-Schaefer (LS) technique on a water surface and then transferring the particle monolayer to a temperature sensitive polymer membrane. A 30 nm hexagonal close packed silver nanoparticle 2D array pattern with a 50 nm period has been successfully transferred into S1813 photoresist using I-line exposure wavelength. The resultant feature sizes were 34 nm with a period of 46 nm, due to the surface plasmon resonance where the S1813 photoresist feature is approximately 11 times smaller than I-line exposure wavelength.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Engineering
Physics and Astronomy
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Uncontrolled Keywords: Nanolithography; Nanoparticle; Self assembly; Silver; Surface plasmon resonance
Publisher: Elsevier
ISSN: 0167-9317
Last Modified: 04 Jun 2017 02:03
URI: http://orca.cf.ac.uk/id/eprint/8272

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