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Epitaxial growth of high quality WO3 thin films

Leng, X., Pereiro, J., Strle, J., Bollinger, A. T. and Bozovic, I. 2015. Epitaxial growth of high quality WO3 thin films. APL Materials 3 (9) , 096102. 10.1063/1.4930214

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We have grown epitaxial WO3 films on various single-crystal substrates using radio frequency magnetron sputtering. While pronounced surface roughness is observed in films grown on LaSrAlO4 substrates, films grown on Y AlO3 substrates show atomically flat surfaces, as demonstrated by atomic force microscopy and X-ray diffraction (XRD) measurements. The crystalline structure has been confirmed to be monoclinic by symmetric and skew-symmetric XRD. The dependence of the growth modes and the surface morphology on the lattice mismatch are discussed.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Physics and Astronomy
Subjects: Q Science > QC Physics
Uncontrolled Keywords: Epitaxy; Surface morphology; Thin film growth; X-ray diffraction; Crystal structure
Publisher: AIP Publishing
ISSN: 2166-532X
Funders: Department of Energy, USA
Date of First Compliant Deposit: 22 September 2016
Date of Acceptance: 25 August 2015
Last Modified: 04 May 2020 16:30

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