Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metaloxide-semiconductor device

Koh, Donghyi, Shin, Seung Heon, Ahn, Jaehyun, Sonde, Sushant, Kwon, Hyuk-Min, Orzali, Tommaso ORCID: https://orcid.org/0000-0001-9446-5789, Kim, Dae-Hyun, Kim, Tae-Woo and Banerjee, Sanjay K. 2015. Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metaloxide-semiconductor device. Applied Physics Letters 107 (18) , 183509-1-183509-3. 10.1063/1.4935248

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Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Physics and Astronomy
Subjects:	Q Science > QC Physics
Publisher:	American Institute of Physics
ISSN:	0003-6951
Date of Acceptance:	24 October 2015
Last Modified:	01 Nov 2022 11:15
URI:	https://orca.cardiff.ac.uk/id/eprint/94345

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